Scope and topics
The 1st Be-lux workshop will be held in Belvaux from 11th to 12th September 2014.
The workshop will provide a common ground to address today's challenges and facilitate discussions on improving the state of the art and increasing fundamental insights related to chemical vapor deposition (CVD), atomic layer deposition (ALD), plasma-CVD, epitaxy, chemical etching and surface functionalization. These processes share a common involvement of complex interactions between solid surfaces and reactive species from gaseous and possibly liquid phases. Private and public research in these areas is inherently multidisciplinary and addresses the topic from process development, monitoring and application angles.
For this workshop we invite contributions that concern:
- Innovative chemistries or hardware modifications for film growth and surface treatments. This includes the ALD of metals and the growth of multi-phase coatings; issues related to the chemical etching of some challenging materials (e.g. Pt) as well as to other general limitations such as side wall damage and surface roughness.
- In situ monitoring approaches, such as those involving e.g. infrared spectroscopy, mass-spectrometry, ellipsometry, X-ray techniques, gravimetry and optical characterization. Diagnostic techniques in real time are required for the understanding of surface chemistries and material growth, providing information at the molecular level and nanometric scale; and assessing process kinetics. Both are essential inputs for process modeling and upscaling.
- Theoretical approaches, such as DFT modeling, to improve the understanding of deposition and etch processes.
- Integrating scientific and engineering developments to address novel applications involving the deposition of 2D materials (MX2, graphene, superlattices,..), 3D structures (conformal deposition, filling, nucleation, deposition of nano-sized powder…) and the growth of multi-component coatings.